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Accueil du site > Équipes de recherche > Matériaux Inorganiques > Matériaux, Plasmas et Procédés > Publications


par Angélique Bousquet - 2 octobre 2017


Investigations of temperature and power effects on Cu(In,Ga)Se2 thin film formation during a three-stage hybrid co-sputtering/evaporation process.
J. Posada, M. Jubault, A. Bousquet, E. Tomasella, D. Lincot – Progress in Photovoltaics : Research and Applications, 2018, 26, 24-37.


Preparation and characterization of a red luminescent composite composed of EVA copolymer and Y3BO6:Eu3+ phosphor.
A. Chapel, R. Boonsin, G. Chadeyron, D. Boyer, A. Bousquet, R.Mahiou, W. H. Cassinelli, C. V. Santilli, S. Therias, New Journal of Chemistry, 2017, 41, 12006-12013.

The investigation of thermal stability of Al/NbMoN/NbMoON/SiO2 solar selective absorbing coating.
P. Song, Y. Wu, L. Wang, Y. Sun, Y. Ning, Y. Zhang, B. Dai, E. Tomasella, A. Bousquet, C. Wang, Solar Energy Materials and Solar Cells, 171 (2017) 253-257.

Optical simulation and preparation of novel Mo/ZrSiN/ZrSiON/SiO2 solar selective absorbing coating Solar Energy Materials and Solar Cells
Y. Ning, W. Wang, L. Wang, Y. Sun, P. Song, H. Man, Y. Zhang, B. Dai, J. Zhang, C. Wang, Y. Zhang, S. Zhao, E. Tomasella, A. Bousquet, Joel Cellier, Solar Energy Materials and Solar Cells, 167 (2017) 178-183.

Tuning of reflectance transition position of Al-AlN cermet solar selective absorbing coating by simulating
Y. Ning, W. Wan, Y. Sun, Y. Wu, H. Man, C. Wang, S.i Zha, E. Tomasella, A. Bousquet, Y. Zhang, Infrared Physics & Technology, 80 (2017) 65–70.

Reactive Gas Pulsing Sputtering Process, a promising technique to elaborate silicon oxynitride multilayer nanometric antireflective coatings
A Farhaoui, A Bousquet, R Smaali, E Centeno J Cellier, C Bernard, R Rapegno, F Réveret and E Tomasella, J Phys D : Appl Phys, 50 (2017) 015306.

Plasma and fluorination combination for stable multifunctionality of LDPE packaging films
J. Peyroux, M. Dubois*, E. Tomasella, N. Batisse, L. Frézet, E. Petit, A. P. Kharitonov, D. Flahaut, Plasma Processes and Polymers, 2017, 14, e1600066.


In Situ Monitoring of Cu(In1-x,Gax)Se2 Composition and Target Poisoning by Real Time Optical Emission Spectroscopy During Deposition From a Hybrid Sputtering/Evaporation Process
Jorge Posada, Angélique Bousquet, Marie Jubault, Daniel Lincot, Eric Tomasella, Plasma Processes and Polymers, 13, 2016, 997-1007.

Effects of substrates, film thickness and temperature on thermal emittance of Mo/substrate deposited by magnetron sputtering
Yuping Ning, Wenwen Wang, Ying Sun, Yongxin Wu, Yingfang Liu, Hongliang Man, Muhammad Imran Malik, Cong Wang, Shuxi Zhao, Eric Tomasella, Angélique Bousquet, Vacuum, 128 (2016) 73-79.

Investigation on low thermal emittance of Al films deposited by magnetron sputtering
Y. Ning, W. Wang, Y. Sun, Y. Wu, Y. Liu, H. Man, C. Wang, Y. Zhang, S. Zhao, E. Tomasella, A. Bousquet, Infrared Physics & Technology (2016),76, 133-138.


Multiphase structure of tantalum oxynitride TaOxNy thin films de-posited by reactive magnetron sputtering
C. Taviot-Guého, J. Cellier, A. Bousquet, E. Tomasella, J Phys Chem C, (2015), 119 (41), pp 23559–23571.

Study on the thermal stability of Al/NbTiSiN/NbTiSiON/SiO2 solar selective absorbing coating
Y. Wu, C. Wang, Y. Sun, Y. Ning, Y. Liu, Y. Xue, W. Wang, S. Zhao, E. Tomasella, A. Bousquet – Solar Energy, 119 (2015) 18-28.

In-situ optical emission spectroscopy for a better control of hybrid sputtering/evaporation process for the deposition of Cu(In,Ga)Se2 layers
J. Posada, M. Jubault, A. Bousquet, E. Tomasella, D. Lincot, Thin Solid Films, 582 (2015) 279-283.

Optical simulation and experimental optimization of Al/NbMoN/NbMoON/SiO2 solar selective absorbing coatings
Y. Wu, C. Wang, Y. Xue, Y. Ning, Y. Sun, S. Zhao, E. Tomasella, A. Bousquet, Solar Energy Materials & Solar Cells, 134 (2015) 373-380.


Structural and ellipsometric study on tailored optical properties of tantalum oxynitride films deposited by reactive sputtering
A. Bousquet, F.i Zoubian, J.Cellier, C. Taviot-Gueho, T. Sauvage, E. Tomasella, J. Phys. D., 47 (2014) 475201.


Control the composition of tantalum oxynitride films by sputtering a Tantalum target in Ar/O2/N2 radiofrequency magnetron plasmas
A. Bousquet, F. Zoubian, J. Cellier, T. Sauvage, E. Tomasella, Plasma Processes and Polymers, 10(11) (2013) 990-998.